File:Thin film surface growth defect.jpg

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English: During the thin film deposition by MOCVD it is possible to form a film with small lattice constant on film with big one. In this case upper film will face tensile stress and will seek a way to get rid of it. Some ways of making it is: to growth not as a single sheet, but as a small sheets, to form cracks and holes. This image shows how film avoided cracking by changing the way it grew from small scales to single standing pyramids, which coalesced with time.
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Author Evavilova

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Date/TimeThumbnailDimensionsUserComment
current10:33, 12 December 2017Thumbnail for version as of 10:33, 12 December 20171,280 × 960 (190 KB)Evavilova (talk | contribs)User created page with UploadWizard

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