File:NDL1084294 東京工業學校一覽 從明治28年至明治29年.pdf

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Original file (6,014 × 4,300 pixels, file size: 35.98 MB, MIME type: application/pdf, 73 pages)

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Summary

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東京工業學校一覽   (Wikidata search (Cirrus search) Wikidata query (SPARQL)  Create new Wikidata item based on this file)
Title
東京工業學校一覽
image of artwork listed in title parameter on this page
Volume 從明治28年至明治29年
Publisher
東京工業學校
Language jpn
Publication date

1895

1895
Place of publication JP
Source

doi:10.11501/1084294

institution QS:P195,Q477675
Publication Place
InfoField
[東京]
Subject: NDC
InfoField
377
Extent
InfoField
125p ; 20cm
Material Type
InfoField
Book
Source Identifier: JPNO
InfoField
21365154
Date Digitized: W3CDTF
InfoField
2010-03-31
Audience
InfoField
一般
Title Transcription
InfoField
トウキョウ コウギョウ ガッコウ イチラン
Source Identifier: NDLBibID
InfoField
000009259161
Call Number
InfoField
特30-876
Contents
InfoField
標題

目次

第一章 沿革及組織/1丁

商議委員/3丁

職員/4丁

第二章 設備/10丁

第三章 教科及學科課程/13丁

教科細目

化學機械兩工藝部各科ニ課スル學科

數學/18丁

物理學/18丁

機械製圖/20丁

工塲建築法/20丁

英語/21丁

簿記/21丁

化學機械兩工藝部各科ニ課スル副科

工業經濟/22丁

工業衞生附救急法/23丁

化學工藝部各科ニ課スル學科

化學/24丁

一般應用化學/26丁

應用機械學/28丁

定性分析/30丁

定量分析/31丁

工業分析/32丁

圖畫/32丁

染織工科ニ課スル學科

染色法及配色法/33丁

機織法及意匠論/35丁

實修/36丁

窯業科ニ課スル學科

陶磁噐、玻璃、セメント練瓦、漆灰等ノ製造法/38丁

實修/40丁

應用化學科ニ課スル學科

特別應用化學/42丁

電鑄及電鍍法/45丁

實修/45丁

機械科ニ課スル學科

數學/47丁

工具用法/48丁

應用重學/53丁

電氣學特別講義/56丁

製造用諸機械/56丁

發動機/58丁

圖畫/62丁

實修/63丁

第四章 入學及卒業/65丁

第五章 學費/70丁

校友會/71丁

生徒現數/71丁

染織工科生徒/72丁

窯業科生徒/73丁

應用化學科生徒/73丁

機械科生徒/74丁

卒業生現數/77丁

染織工科卒業生/78丁

窯業科卒業生/83丁

應用化學科卒業生/85丁

機械科卒業生/88丁

卒業生就業表/99丁

卒業生并現在學生徒地方別表/100丁

卒業生就職地方別表/104丁

卒業生并在學生ノ状况/108丁

工業教員養成所/111丁

Licensing

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Public domain
According to Japanese Copyright Law (June 1, 2018 grant) the copyright on this work has expired and is as such public domain. According to articles 51, 52, 53 and 57 of the copyright laws of Japan, under the jurisdiction of the Government of Japan works enter the public domain 50 years after the death of the creator (there being multiple creators, the creator who dies last) or 50 years after publication for anonymous or pseudonymous authors or for works whose copyright holder is an organization.

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