File:Patterning in silicon using focused ion beam milling with ZEISS Crossbeam 540 (29468665645).jpg

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Nanoscale patterning of the official logo for the 200th birthday of Carl Zeiss in 2016. Patterned in silicon using focused ion beam milling with ZEISS Crossbeam 540. www.zeiss.com/carlzeiss200 & www.zeiss.com/crossbeam

Images donated as part of a GLAM collaboration with Carl Zeiss Microscopy - please contact Andy Mabbett for details.
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Source Patterning in silicon using focused ion beam milling with ZEISS Crossbeam 540
Author ZEISS Microscopy from Germany

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This file is licensed under the Creative Commons Attribution 2.0 Generic license.
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Under the following conditions:
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This image was originally posted to Flickr by ZEISS Microscopy at https://flickr.com/photos/75834543@N06/29468665645. It was reviewed on 9 November 2016 by FlickreviewR and was confirmed to be licensed under the terms of the cc-by-2.0.

9 November 2016

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current15:33, 9 November 2016Thumbnail for version as of 15:33, 9 November 20161,406 × 1,125 (91 KB)Pigsonthewing (talk | contribs)Transferred from Flickr via Flickr2Commons

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