File:Extreme ultraviolet lithography tool.jpg

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Description
English: EUVL tool, that deposits virtually defect-free, ultra-thin films on integrated circuits.
Date
Source Laser Programs, the first 25 years, 1972-1997, available from osti.gov.
Author Lawrence Livermore National Laboratory
Permission
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Public domain This image is a work of a United States Department of Energy (or predecessor organization) employee, taken or made as part of that person's official duties. As a work of the U.S. federal government, the image is in the public domain.

Please note that national laboratories operate under varying licences and some are not free. Check the site policies of any national lab before crediting it with this tag.

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current18:19, 22 September 2011Thumbnail for version as of 18:19, 22 September 2011713 × 605 (80 KB)Bomazi (talk | contribs){{Information |Description ={{en|1=EUVL tool, that deposits virtually defect-free, ultra-thin films on integrated circuits.}} |Source =''Laser Programs, the first 25 years, 1972-1997'', available from [http://www.osti.gov/bridge/product.biblio.

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