File:EUV pattern shift vs mask focal plane.png

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Description The 50 nm half-pitch EUV pattern shifts as the mask is moved away from its target focal plane, as well as through wafer defocus. Ref.: T. Schmoeller et al., Proc. SPIE 6921, 69211B (2008).
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Source Graphic editor
Author Guiding light

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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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The original description page was here. All following user names refer to en.wikipedia.
Date/Time Dimensions User Comment
2017-05-13 01:49:21 1032 × 462 Guiding light
2017-05-13 01:19:06 1008 × 508 Guiding light
2017-05-13 01:16:21 1028 × 505 Guiding light
2017-05-12 23:46:53 1121 × 536 Guiding light
2017-03-11 01:18:07 829 × 411 Guiding light Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]]

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current15:56, 2 April 2020Thumbnail for version as of 15:56, 2 April 20201,032 × 462 (110 KB)Hippymoose17 (talk | contribs)Transferred from en.wikipedia (MTC!) (1.1.0)

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