File:Argonne's Tribology Lab Plasma-Assisted Chemical-Vapor Deposition.jpg
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DescriptionArgonne's Tribology Lab Plasma-Assisted Chemical-Vapor Deposition.jpg | This commercial system was designed for the semiconductor field and contains three 8"-diameter targets that can be run individually or simultaneously to deposit metallic or dielectric film son substrates ranging up to 24" in diameter. See the entire <a href="http://www.transportation.anl.gov/facilities/tribology_tour.html">Tribology Laboratory photo tour</a>. View more about Argonne's transportation research at <a href="http://www.transportation.anl.gov">www.transportation.anl.gov</a>. Photo courtesy of <a href="http://www.anl.gov">Argonne National Laboratory</a>. | ||
Date | |||
Source | Flickr: Argonne's Tribology Lab: Plasma-Assisted Chemical-Vapor Deposition | ||
Author | Argonne National Laboratory | ||
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 02:17, 27 October 2011 | 3,000 × 2,855 (2.66 MB) | Flickr upload bot (talk | contribs) | Uploaded from http://flickr.com/photo/35734278@N05/3469453524 using Flickr upload bot |
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Orientation | Normal |
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Horizontal resolution | 300 dpi |
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Software used | Adobe Photoshop CS3 Macintosh |
File change date and time | 13:29, 29 April 2008 |
Color space | Uncalibrated |
Image width | 3,000 px |
Image height | 2,855 px |
Date and time of digitizing | 08:29, 29 April 2008 |
Date metadata was last modified | 08:29, 29 April 2008 |