File:ASML EUVL blurred NILS.PNG
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[edit]DescriptionASML EUVL blurred NILS.PNG |
English: Data from ASML presentation at International Workshop on EUVL, Maui 2010: J. Benschop, "EUV: Status and Challenges Ahead". The decreasing NILS (normalized image log slope) indicates decreasing quality of the lithographic patterning. 2 is the ideal value for acceptable printing,[1] although values as low as 1.3 could be used in current production.[2]
The ADT (Alpha Demo Tool) and MET (Micro-Exposure Tool) were installed for learning purposes only, while the NXE:3300 is ASML's targeted production tool. References
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Date | 19 August 2010 (original upload date) |
Source | Transferred from en.wikipedia to Commons. |
Author | Guiding light at English Wikipedia |
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Original upload log
[edit]The original description page was here. All following user names refer to en.wikipedia.
Date/Time | Dimensions | User | Comment |
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2010-08-29 17:19 | 803×546× (19764 bytes) | Guiding light | Updated data from International Workshop on EUVL, 2010 (J. Benschop). |
2010-08-19 15:09 | 677×400× (11211 bytes) | Guiding light | Data from ASML presentation at Semicon West 2010: "EUVL - getting ready for volume introduction," H. Meiling, July 14, 2010. |
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 07:24, 13 March 2016 | 803 × 546 (19 KB) | OgreBot (talk | contribs) | (BOT): Reverting to most recent version before archival | |
07:24, 13 March 2016 | 677 × 400 (11 KB) | OgreBot (talk | contribs) | (BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2010-08-19 15:09:35 by Guiding light | ||
10:08, 28 February 2016 | 803 × 546 (19 KB) | FastilyClone (talk | contribs) | Transferred from enwp |
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