File:ANAB amorphization at various energies.png
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| Description |
English: High resolution TEM images of amorphous SiO2 layer on the surface of silicon created by ANAB treatment at various beam energies |
| Date | |
| Source | Own work |
| Author | Dshashkov |
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I, the copyright holder of this work, hereby publish it under the following license:
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 15:17, 24 October 2018 | | 1,872 × 681 (992 KB) | Dshashkov (talk | contribs) | Cross-wiki upload from en.wikipedia.org |
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