File:8 nm hp EUV polarization.PNG
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Summary
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| Description |
English: This coherent two-beam interference image formed by 13.5 nm EUV light at 8 nm half-pitch is critically dependent on polarization state. For the natural unpolarized state, there is already significant loss of contrast compared to the ideal, TE-polarized state. For the naturally assumed 50% average pattern density, the effective flare level (due to the lowered contrast from the TM component) for the unpolarized case is 18%.[1]
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| Date | 15 March 2010 (original upload date) |
| Source | Transferred from en.wikipedia to Commons. |
| Author | Guiding light at English Wikipedia |
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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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Attribution: Guiding light at English Wikipedia
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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Original upload log
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The original description page was here. All following user names refer to en.wikipedia.
| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 2010-03-15 08:22 | 621×408× (15825 bytes) | Guiding light | The image formed by 13.5 nm EUV light at 8 nm half-pitch is critically dependent on polarization state. For the natural unpolarized state, there is already significant loss of contrast compared to the ideal, TE-polarized state. |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 10:08, 28 February 2016 | | 621 × 408 (15 KB) | FastilyClone (talk | contribs) | Transferred from enwp |
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