File:80 eV electron blur in EUV Resist.png
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| Description |
English: The exposure of a leading EUV chemically amplified resist by an 80 eV flood electron beam can lead to resist thickness loss up to ~7.5 nm. The 80 eV represents typical EUV photoelectron energy, so resist dimensions requiring control to within ~15 nm would be affected. Ref.: Y. Kandel et al., Proc. SPIE 10143, 101430B (2017). |
| Date | |
| Source | Graphic editor |
| Author | Guiding light |
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Guiding light at English Wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
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Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
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The original description page was here. All following user names refer to en.wikipedia.
| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 2017-06-09 01:47 | 480×284× (8276 bytes) | Guiding light | |
| 2017-06-09 01:21 | 889×584× (53304 bytes) | Guiding light | Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]] |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 16:00, 17 November 2018 | | 480 × 284 (8 KB) | OgreBot (talk | contribs) | (BOT): Reverting to most recent version before archival |
| 16:00, 17 November 2018 |  | 889 × 584 (52 KB) | OgreBot (talk | contribs) | (BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2017-06-09 01:21:03 by Guiding light | |
| 08:25, 17 November 2018 |  | 480 × 284 (8 KB) | Tn4196 (talk | contribs) | Transferred from en.wikipedia via #commonshelper |
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