File:Μem EM Microelectronic die H1053S001S 3.jpg

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English: Unknown CMOS IC fabbed and designed by µem. Mask design could be from 1993. "P.N" and "V.M" are likely the initials of the designers. The size of the die itself (edge of the outermost metallization layer) is about 2.6x3.5 mm (9.1 mm²).
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Author Phiarc
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Pretty much just a test shot with the Nikon CFI 10/0.25, heavily defringed (blue-purple) with some halo artifacts due to that. Stitch of two fields. Well matched resolution of camera and objective with resolution ~1.3 µm, and approx 450 nm/px respectively about 2.5 px/r.

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Date/TimeThumbnailDimensionsUserComment
current17:14, 9 April 2023Thumbnail for version as of 17:14, 9 April 20237,083 × 8,990 (18.26 MB)Phiarc (talk | contribs)Uploaded own work with UploadWizard

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